Semiconductor device fabrication |
---|
MOSFET scaling (process nodes) |
Future
|
|
The 350 nm process refers to the level of MOSFET semiconductor process technology that was reached around the 1993–1996 timeframe, by leading semiconductor companies like Sony, Intel and IBM.
Technology demonstrations[]
A MOSFET with a 300 nm channel length was fabricated by a research team led by K. Deguchi and Kazuhiko Komatsu at Nippon Telegraph and Telephone (NTT) in 1985.[1]
In 1989, an IBM research team led by Egyptian engineer Hussein I. Hanafi demonstrated a 300 nm CMOS transistor.[2]
Products featuring 350 nm manufacturing process[]
- Sony introduced a 16 MB SRAM memory chip manufactured with a 350 nm process in 1993.[3]
- NEC, which introduced a 350 nm 3LI CMOS process in 1994, used it for processors in the Nintendo 64 (N64) game console, released in 1996.
- Intel Pentium (P54CS, 1995), Pentium Pro (1995) and initial Pentium II CPUs (Klamath, 1997).
- AMD K5 (1996) and original AMD K6 (Model 6, 1997) CPUs.
- МЦСТ-R150 (2001).
- Parallax Propeller (2006), 8 core microcontroller.[5]
References[]
- ↑ Deguchi, K.; Komatsu, Kazuhiko; Miyake, M.; Namatsu, H.; Sekimoto, M.; Hirata, K. (1985). "Step-and-Repeat X-ray/Photo Hybrid Lithography for 0.3 μm Mos Devices". 1985 Symposium on VLSI Technology. Digest of Technical Papers: 74–75. ISBN 4-930813-09-3.
- ↑ Hanafi, Hussein I. (1989). "Submicron CMOS Circuit Simulation Model Accurate from Liquid Nitrogen to Room Temperature". In Heuberger, Anton (ed.). ESSDERC 89: Berlin, [Sept. 11 to 14, 1989]. Berlin Heidelberg New York, NY London Paris Tokyo Hong Kong: Springer. ISBN 978-0-387-51000-2.
- ↑ "Memory". STOL (Semiconductor Technology Online). Retrieved 25 June 2019.
- ↑ "Reality Co-Processor − The Power In Nintendo64" (PDF). Silicon Graphics. Retrieved 18 June 2019.
- ↑ "Propeller I semiconductor process technology? Is it 350nm or 180nm? - Parallax Forums". Forums.parallax.com. Archived from the original on 2012-07-10. Retrieved 2015-09-13.
Preceded by 600 nm |
CMOS manufacturing processes | Succeeded by 250 nm |